Process simulation in the hybrid microelectronic technology

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In cooperation with the Institute of Electronic Technology at the TU-Dresden and the company Texas Instruments Inc. Dallas a numerical simulation model for film resistor layout and trim strategy evaluation was developed in the context of complex film resistor designs to be LASER trimmed. The results are confirmed by comparisons with measured real world data. The practical application of fast, reliable numerical methods is a central aspect here for both the resistor layout and the trim strategy design.

    The goals were:
  1. to guarantee optimal trims under all series production conditions by resistor design
  2. to develop and check design rules for different resistor shapes and possible trim paths
  3. to derivate induvidual trim process parameters for each case


A more precisely survey of the project:

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